Since our establishment in 1979, Samco Inc. has developed a wealth of enabling technologies in deposition, etching, and surface treatment, driving cutting-edge research and device production. We offer a variety of advanced manufacturing equipment, including precise thin film deposition systems like Atomic Layer Deposition (ALD), Cathode-coupled Plasma Enhanced Chemical Vapor Deposition (PECVD), and Anode-coupled PECVD. Our high-performance etching systems, such as Atomic Layer Etching (ALE), Inductively Coupled Plasma (ICP), Deep Reactive Ion Etching (DRIE), Reactive Ion Etching (RIE), and Xenon Difluoride Etching, support a wide range of etching applications in semiconductor device fabrication. Additionally, our Cleaning Systems, including Aqua Plasma® Cleaners, Plasma Cleaning Systems, and UV Ozone Cleaners, are effective solutions for removing organic contaminants and surface modifications. Whether you need a top-notch R&D system or a production worthy system, Samco has innovative solutions to meet your needs from lab to fab.
Deposition Systems
Our deposition solutions include a variety of high-performance systems designed for precision and versatility:
- Atomic Layer Deposition (ALD)
- Anode PECVD
- Cathode PECVD
Etching Systems
Samco provides an array of advanced etching solutions, backed by process expertise and tailored support:
- Atomic Layer Etching (ALE)
- Inductively Coupled Plasma (ICP) Etching
- Silicon Deep Reactive Ion Etching (Si DRIE)
- Reactive Ion Etching (RIE)
- Xenon Difluoride (XeF2) Etching
Surface Treatment Systems
Our advanced dry cleaning systems use gas-based processes to overcome limitations of wet chemical cleaning:
- Aqua Plasma® Cleaners
- Plasma Cleaning Systems
- UV Ozone Cleaning Systems