⌀4″
Open Load
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Compact benchtop system
The UV-1 is a versatile and compact benchtop UV ozone cleaner designed for gentle yet effective organic material removal from a wide variety of substrates. Combining ultraviolet irradiation, ozone, and stage heating, the UV-1 ensures high-performance cleaning while maintaining substrate integrity. This system is ideal for applications across industries requiring precision surface preparation, including semiconductors, optics, and advanced materials.
Key Features & Benefits
- Versatile sample processing
Supports substrates up to ø100 mm (4 inches), including silicon, glass, ceramics, and compound semiconductors like GaN, GaAs, InP, and SiC. - Accelerated cleaning
Integrated heating stage enhances cleaning rates and provides a broad process temperature range. - Compact design
Minimal benchtop footprint, maximizing lab space efficiency. - User-friendly operation
Operates at atmospheric pressure, eliminating the need for a vacuum system. - Safe and gentle process
Fully dry process avoids electrical damage and ensures substrate safety. - Enhanced safety features
Lid interlock prevents operation when open; automatic N₂ purge cycle, heated stage fuse protection, ozone scrubber, and emergency stop switch ensure reliable and safe operation. - Environmental compliance
Ozone catalyst unit reduces exhaust ozone concentration to safe levels.
Applications
- Surface cleaning of plastic packages and lead-frames.
- Precision cleaning of compound semiconductor substrates such as GaN, GaAs, InP, and SiC.
- Surface modification to improve wettability and adhesion.
- Thin oxidized layer deposition through controlled surface oxidation.
- Photoresist ashing, stripping, and descumming.
- Organic contaminant removal from delicate surfaces.
- UV curing for enhanced material properties.
