406 x 413 mm
Open Load
none
none
High-Capacity Plasma Cleaner for Diverse Applications
The PC-1100 is a versatile parallel-plate plasma cleaner engineered for large-scale cleaning and surface modification tasks. With a spacious chamber and flexible shelf configurations, it is capable of processing large substrates (up to 400 x 400 mm) and supports both RIE and Plasma Etching modes. This system is ideal for a wide range of industries, from microelectronics to optics and beyond.
Key Features & Benefits
- High-capacity processing
Accommodates sample sizes up to 400 x 400 mm with multiple shelves for high-throughput operations. - Customizable configurations
Flexible electrode shelves enable precise adjustments to process diverse sample types and batch sizes. - Optimized for production
Large processing shelves support high-volume production requirements. - Automated control
Fully automatic operation with manual override for process customization. - Advanced interface
Intuitive PLC touchscreen controller for seamless process monitoring and control. - Efficient maintenance
Dry pump and streamlined layout ensure quick, hassle-free upkeep. - Proven durability
Backed by a global installed base of over 150 systems.
Applications
- Gate oxide films and passivation films for next-generation power devices
- Uniform film formation on 3D structures such as MEMS
- Deposition on the surface of a laser
- Passivation film of carbon nanotubes