406 x 413 mm
Open Load
none
none

High-Capacity Plasma Cleaner for Diverse Applications

The PC-1100 is a versatile parallel-plate plasma cleaner engineered for large-scale cleaning and surface modification tasks. With a spacious chamber and flexible shelf configurations, it is capable of processing large substrates (up to 400 x 400 mm) and supports both RIE and Plasma Etching modes. This system is ideal for a wide range of industries, from microelectronics to optics and beyond.

Key Features & Benefits

  • High-capacity processing
    Accommodates sample sizes up to 400 x 400 mm with multiple shelves for high-throughput operations.
  • Customizable configurations
    Flexible electrode shelves enable precise adjustments to process diverse sample types and batch sizes.
  • Optimized for production
    Large processing shelves support high-volume production requirements.
  • Automated control
    Fully automatic operation with manual override for process customization.
  • Advanced interface
    Intuitive PLC touchscreen controller for seamless process monitoring and control.
  • Efficient maintenance
    Dry pump and streamlined layout ensure quick, hassle-free upkeep.
  • Proven durability
    Backed by a global installed base of over 150 systems.

Applications

  • Gate oxide films and passivation films for next-generation power devices
  • Uniform film formation on 3D structures such as MEMS
  • Deposition on the surface of a laser
  • Passivation film of carbon nanotubes

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