⌀300 mm
Cassette Loading
LSCVD®
none
Processing up to ø300 mm (12") with atmospheric cassette loading
The PD-330STC is a low-temperature (80 ~ 400°C), high-rate (>300 nm/min) plasma-enhanced CVD system for mass production. Samco’s unique liquid source CVD system uses self-bias deposition techniques and a liquid TEOS source to deposit SiO2 films with low stress, from thin films to extremely thick films (up to 100 µm). This system achieves high throughput by employing atmospheric cassette loading and excellent process uniformity of ø300 mm wafers.
Key Features & Benefits
- Processing up to ø300 mm (12″)
- Cathode coupled self-bias deposition techniques enables high-rate (>300 nm/min) deposition of low-stress films
- By low temperature deposition, films can be deposited on top of plastic surfaces
- Excellent step-coverage of high aspect ratio structures
- Control of refractive index by using germanium, phosphorus, and boron liquid precursor
- Excellent process uniformity and repeatability
Applications
- Deposition of protective films over plastic materials
- Deposition of the insulating film on via sidewalls for 3D LSIs
- Fabrication of optical waveguides (fiber core/cladding)
- Fabrication of masks for use in the production of micromachines
- Coverage of high aspect ratio structures such as MEMS devices
- Temperature compensation film and passivation film for SAW devices
