⌀4″
Cassette Loading
LSCVD®
Vacuum Cassette Chamber
High Temperature Cassette Loading System for Advanced R&D
The PD-101TC is an extremely versatile cassette loading plasma enhanced chemical vapor deposition (PECVD) system for R&D. This system comes equipped with high-temperature substrate heating control of up to 700°C; extremely high compared to other PECVD systems. It also supplies multiple frequency RF power sources, with anode-cathode mode switching capabilities. With a variety of features, the system is capable of depositing a wide range of films including SiO2/SiNx.
Key Features & Benefits
- Processing up to ø100 mm (ø4″)
- Substrate temperate control up to 700°C
- Multiple frequency RF power sources: 13.56, 27, 40, and 60 MHz
- 400 kHz can be superimposed on any one of the above frequencies
- Anode/Cathode mode switching (high frequency RF biasing can be switched back and forth between upper and lower electrodes)
- Up to 8 gas lines for deposition of various materials
- Compatible with Liquid Precursors, such as TEOS for SiO2, SN-2 for SiN
- Changeable electrode gap (by spacer)
- Multiple chamber ports for various applications such as process diagnostics
