Products
Precise line and space pattern processing for imprint mold applications
Line and space patterns with a width of 5 μm were fabricated in quartz glass using the RIE-400iPB, a research and development device. The process achieved a depth of 6 μm with a forward taper due to Cr mask retreat during etching, with a selectivity to the Cr mask of approximately 100:1.
Photo courtesy of Yamagata Research Institute of Technology.