TEOS-SiO₂ deposition for optical waveguide embedding with cathode PECVD
This process demonstrates the deposition of SiO2 for embedding optical waveguides using cathode-coupled plasma-enhanced chemical vapor deposition (PECVD). The results showcase precise refractive index control, essential for core formation, enabling void-free embedding of waveguides even with an aspect ratio of 1. The optimized conditions, leveraging high sputtering effects, ensure uniform deposition and high-quality optical performance.