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FTIR characterization of SN-2-SiNx deposition with cathode PECVD
FTIR analysis of SN-2-SiNx films reveals bond peak positions closely matching those of SiH4-SiNx films, indicating comparable film quality. Unlike organic precursors, SN-2’s inorganic composition ensures the absence of carbon-related peaks, resulting in high-purity SiNx films. This demonstrates that SN-2-SiNx can achieve the same superior performance as SiH4-SiNx while maintaining precise control over film characteristics.