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Products
Deposition Systems
Atomic Layer Deposition (ALD) Systems
Anode PECVD Systems
Cathode PECVD Systems
Etching Systems
Atomic Layer Etching (ALE) Systems
Inductively Coupled Plasma (ICP) Etching Systems
Si Deep Reactive Ion Etching (DRIE) Systems
Reactive Ion Etching (RIE) – Plasma Etching Systems
Xenon Difluoride (XeF2) Etching Systems
Surface Treatment Systems
Aqua Plasma® Cleaners
Plasma Cleaning Systems
UV Ozone Cleaning Systems
Processes
Deposition
Atomic Layer Deposition (ALD)
Anode PECVD
Cathode PECVD
Etching
Atomic Layer Etching (ALE)
Compound Semiconductor Etching
Silicon Etching & DRIE
Metal/Dielectric Etching
Failure Analysis
Surface Treatment
Aqua Plasma®
Plasma Cleaning
UV Ozone Cleaning
Markets
News & Events
Events
News
Disclosure
Technical Reports
Interviews
Customer Publications
Tutorials
About
Company Overview
Global Locations
History
Contact
Product Info Request
Technical Support Request
Careers
ICFO: Dr. Johann Osmond
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ICFO: Dr. Johann Osmond
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Europe
ICFO-The Institute of Photonic Sciences
LEPECVD
PD-220NL
photonics
PICs
Quantum Materials
Research Institute
RIE-10NR
RIE-400iP
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