320 x 230 mm
Open Load
none
none
Compact Plasma Cleaner for R&D and Low-Volume Production
The PC-300 is a space-efficient, parallel-plate plasma cleaner designed for precise removal of organic and inorganic contaminants from surfaces. Equipped with a compact chamber and flexible electrode shelves, it is ideal for R&D applications and small-scale production. The system supports a variety of processes, including Reactive Ion Etching (RIE) and Plasma Etching, ensuring versatility for a wide range of sample types.
Key Features & Benefits
- Flexible sample processing
Accommodates sample sizes up to 320 x 230 mm with configurable shelf electrodes for diverse applications. - Compact design
Saves valuable lab space while delivering robust performance. - Versatile operation modes
Supports RIE and Plasma Etching processes to meet various cleaning and modification needs. - Ease of use
Fully automatic “one-button” operation with manual override for process flexibility. - User-friendly interface
Intuitive PLC touchscreen controller for streamlined operation. - Low maintenance
Dry pump and simplified system layout minimize downtime. - Proven reliability
Over 150 systems installed globally, ensuring trusted performance.
Applications
- Precision cleaning of optical components, plastic packages, and lead-frames.
- Surface modification to improve wettability and adhesion.
- Photoresist ashing, stripping, and descumming.
- Removal of organic contaminants from delicate surfaces.
