Dr. Takuo Tanaka Team Leader of the Innovative Photon Manipulation Research Team in RIKEN Center for Advanced Photonics (RAP) and Chief Scientist of the Metamaterials Laboratory in RIKEN Cluster for Pioneering Research (CPR). During this interview, we visited RIKEN and had the opportunity to speak with Dr. Takuo Tanaka about his research on metamaterials among…
Introduction Plasma-enhanced chemical vapor deposition (PECVD) systems were initially developed for low-temperature film deposition. However, recent diversification in research and development needs has led to a demand for systems capable of high-temperature film deposition. PECVD systems, a cornerstone of Samco, utilize silicon tetrahydride (SiH4) gas for silicon nitride (SiN) and silicon dioxide (SiO2) film deposition.…
Atomic Layer Deposition Tutorial: Introduction to ALD Atomic Layer Deposition (ALD) is a thin-film deposition technique that utilizes self-limiting surface chemical reactions to achieve precise layer-by-layer growth. By alternately introducing and exhausting two or more reactants into the reaction chamber, ALD enables excellent film thickness control, superior step coverage, and high conformality. As demand for…