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    • Deposition Systems
      • Atomic Layer Deposition (ALD) Systems
      • Anode PECVD Systems
      • Cathode PECVD Systems
    • Etching Systems
      • Atomic Layer Etching (ALE) Systems
      • Inductively Coupled Plasma (ICP) Etching Systems
      • Si Deep Reactive Ion Etching (DRIE) Systems
      • Reactive Ion Etching (RIE) – Plasma Etching Systems
      • Xenon Difluoride (XeF2) Etching Systems
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      • Aqua Plasma® Cleaners
      • Plasma Cleaning Systems
      • UV Ozone Cleaning Systems
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      • Atomic Layer Deposition (ALD)
      • Anode PECVD
      • Cathode PECVD
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      • Compound Semiconductor Etching
      • Silicon Etching & DRIE
      • Metal/Dielectric Etching
      • Failure Analysis
    • Surface Treatment
      • Aqua Plasma®
      • Plasma Cleaning
      • UV Ozone Cleaning
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Daily Archives: September 12, 2024

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ICFO: Dr. Johann Osmond

InterviewsBy MeganSeptember 12, 2024

Nanophotonics research, advanced applications, and the role of RIE-10NR in ICFO’s photonics projects.

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