Scientific Paper on Chemical Vapor Deposition Processing from Harvard University

Direct-liquid-evaporation chemical vapor deposition of smooth, highly conformal cobalt and cobalt nitride thin films

Jing Yang^a, Kecheng Li^a, Jun Feng^b and Roy G. Gordon^a,b
a School of Engineering, Applied Sciences, Harvard University, Cambridge, MA 02138, USA
^b Department of Chemistry and Chemical Biology, Harvard University, Cambridge, MA 02138, USA

SAMCO UV-Ozone cleaner at Harvard University was used to remove organic contaminants from samples.