Three-dimensional Nanowire Structures for Ultra-Fast Separation of DNA, Protein and RNA Molecules

Sakon Rahong^1,2, Takao Yasui^2,3, Takeshi Yanagida⁴, Kazuki Nagashima⁴, Masaki Kanai⁴,
Gang Meng⁴, Yong He⁴, Fuwei Zhuge⁴, Noritada Kaji^2,3, Tomoji Kawai⁴ & Yoshinobu Baba^1,2,3,5
1 Institute of Innovation for Future Society, Nagoya University, JAPAN.
² FIRST Research Center for Innovative Nanobiodevices, Nagoya University, JAPAN.
³ Department of Applied Chemistry, Graduate School of Engineering, Nagoya University, JAPAN.
⁴ The Institute of Scientific and Industrial Research, Osaka University, JAPAN.
⁵ Health Research Institute, National Institute of Advanced Industrial Science and. Technology (AIST), JAPAN.
Scientific Reports 5, Article number: 10584 (2015) doi:10.1038/srep10584

SAMCO Reactive Ion Etching System RIE-10NR was used for SiO₂ plasma etching over Cr mask. This process is used for micro-channel fabrication on microfluidic system which enables ultra-fast separation of biomolecules (DNA, Protein and RNA Molecules).

For our process examples and capabilities of SiO₂ plasma etching, please visit the process data page below.
SiO₂ Dry Etching Process (RIE or ICP-RIE)