Fast patterning and dry-etch of SiNx for high resolution nanoimprint templates

Shu Zhen¹, Wan Jing¹, Lu Bingrui¹, Xie Shenqi¹, Chen Yifang²., Qu Xinping¹ and Liu Ran^1
1 State Key Laboratory of ASIC and System, Department of Microelectronics, Fudan University, Shanghai 200433, China
² Micro and Nanotechnology Centre, Rutherford Appleton Laboratory, Chilton, Didcot, Oxon, OX11 0QX, UK
Journal of Semiconductors (2009) 30, 6

SAMCO Plasma Etching System was used for patterning of SiN_x film (SiN_x plasma etching) with high aspect ratio and vertical sidewalls.