Scientific Paper on Ring Resonator Fabrication Using SiN PECVD by Kyushu University

March 7, 2015 March 7, 2015 Samco 2015 Customer, Photonic Devices, Samco Customer Publication, Silicon/Dielectrics PECVD, SiNx PECVD

Athermal and High-Q Hybrid TiO₂–Si₃N₄ Ring Resonator via an Etching-Free Fabrication Technique

Feng Qiu, Andrew M. Spring, and Shiyoshi Yokoyama*
Institute for Materials Chemistry and Engineering, Kyushu University, 6-1 Kasuga-koen Kasuga-city, Fukuoka, 816-8580, Japan
ACS Photonics (2015) 2, 3 pp 405–409

Samco PECVD system was used for Si3N4 deposition to fabricate a ring resonator.

Periodic Table SiN

For more details of our SiN_x PECVD process capabilities, please visit the page below.
SiN_x PECVD Process

Scientific Paper on Ring Resonator Fabrication Using SiN PECVD by Kyushu University

Athermal and High-Q Hybrid TiO2–Si3N4 Ring Resonator via an Etching-Free Fabrication Technique

Athermal and High-Q Hybrid TiO₂–Si₃N₄ Ring Resonator via an Etching-Free Fabrication Technique