Scientific Paper on Silicon Waveguide and THz Antenna Fabrication by Swinburne Univ. of Technology, Australia
High precision fabrication of antennas and sensors
A. Balcytis1,2,3, G. Seniutinas1,2, D. Urbonas1,3, M. Gabalis3 K. Vaskevicius3, R. Petruskevicius3, G. Molis4, G. Valusis5 and S. Juodkazis1,2
1 Centre for Micro-Photonics and Industrial Research Institute Swinburne, Faculty of Engineering and Industrial Sciences, Swinburne University of Technology, Hawthorn, VIC 3122, Australia
2 Melbourne Centre for Nanofabrication, 151 Wellington Road, Clayton, VIC 3168, Australia
3 Institute of Physics, Center for Physical Sciences and Technology, 231 Savanoriu Avenue, LT-02300 Vilnius, Lithuania
4 Teravil Ltd, Vilnius, LT 01108, Lithuania
5 Semiconductor Physics Institute, Center for Physical Science and Technology, 11 A. Gostauto st., LT01108 Vilnius, Lithuania
Proc. SPIE 9446, Ninth International Symposium on Precision Engineering Measurement and Instrumentation, 94461G (March 6, 2015); doi:10.1117/12.2180814
SOI waveguide was fabricated using Samco ICP etch system for plasma etching of silicon against Cr mask.
For our process examples of silicon plasma etching, please visit the page below.
Si Dry Etching Process (RIE, ICP-RIE or XeF2 Etch)