Scientific paper on GaP grating fabrication from University of Ottawa

May 15, 2022 Samco 2022 Customer, Compound Semiconductor Etching, GaP Etch, Samco Customer Publication, Silicon/Dielectrics Etch, SiO2 Etch

Scalable Fabrication of Nanogratings on GaP for Efficient Diffraction of Near-Infrared Pulses and Enhanced Terahertz Generation by Optical Rectification

Mohammad Bashirpour1, Wei Cui1, Angela Gamouras1,2 and Jean-Michel Ménard1,2
1 Department of Physics, University of Ottawa, Ottawa, ON K1N 7N9, Canada
2 National Research Council Canada, Ottawa, ON K1A 0R6, Canada
Crystals 2022, 12, 684. https://doi.org/10.3390/cryst12050684

Samco RIE system RIE-10NR was used for SiO2 hardmask patterning using photoresist mask. Then, Samco ICP-RIE system was used for GaP etching using the SiO2 hardmask for wafer-scale fabrication of a surface phase grating with submicron feature sizes.