Scientific Paper on Coherent Diffraction Imaging from Hokkaido University

December 15, 2015 Samco 2015 Customer, Optics, Samco Customer Publication, Silicon/Dielectrics Etch, SiO2 Etch

Coherent diffraction imaging of non-isolated object with apodized illumination

Krishna P. Khakurel1,2, Takashi Kimura1,2,3, Yasumasa Joti4, Satoshi Matsuyama3,4, Kazuto Yamauchi3,4 and Yoshinori Nishino1,2,3
1Research Institute for Electronic Science, Hokkaido University, Kita 21, Nishi 10, Kita-ku, Sapporo, Hokkaido, 001-0021, Japan
2Graduate School of Information Science, Hokkaido University, Kita 21, Nishi 10, Kita-ku, Sapporo, Hokkaido, 001-0021, Japan
3Japan Science and Technology Agency, CREST, 4-1-8 Honcho, Kawaguchi, Saitama 332-0012, Japan
4Japan Synchrotron Radiation Research Institute/SPring-8, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198, Japan
5Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1, Yamadaoka, Suita, Osaka 565-0871, Japan
Optics Express (2015) 23, 22, pp. 28182-28190

SAMCO RIE plasma etcher at Hokkaido University was used for fabrication of coherent diffraction imaging samples.