Interview with Professor Ikuo Suemune (Hokkaido University, Japan)
He talks about his research in nano-photonics and the relationship between the research field and SAMCO’s technologies.
Scientific Paper on FeSi2 Plasma Etching from University of Tsukuba
Reactive Ion Etching of β-FeSi2 with Inductively Coupled Plasma
Takayuki Wakayama, Takashi Suemasu, Tomomi Kanazawa and Hiroyuki Akinaga
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
Jpn. J. Appl. Phys. (2006) 45 L569
Samco ICP-RIE etcher was used for plasma etch recipe development of β-FeSi2 on a silicon substrate using fluorine chemistry.
High etch selectivity of β-FeSi2 against silicon was investigated.
Please visit our product page for more details of our ICP plasma etch systems.
ICP Plasma Etch Systems for Si, SiO2, III-V & Metal
Scientific Paper on GaInAsP/InP Photonic Crystal Lasers Using InP Etching by Yokohama National University
Fabrication of GaInAsP/InP photonic crystal lasers by ICP etching and control of resonant mode in point and line composite defects
Kyoji Inoshita and Toshihiko Baba
Department of Electrical & Computer Engineering, Yokohama National University, Japan
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS (2003) 9, NO. 5, SEPTEMBER/OCTOBER
Samco ICP plasma etcher was used for InP plasma etching in GaInAsP/InP photonic crystal laser fabrication.
For more details on our InP plasma etching technologies, please visit the process data page below.
InP Plasma Etching
Testimonial from Optoelectronics Company in Fremont, CA
SAMCO UV-Ozone Cleaners are used for surface cleaning of substrates in device fabrication. This is testimonial from optoelectronics company in Fremont, CA.
The SAMCO UV-1 is a very simple-to-use system and can be effectively integrated into a controlled environment. The system’s internal cavity is leak tight at atmospheric conditions. The system is ideal for accomplishing two goals. First of all, it does an excellent job for treating bond surfaces. Our epoxy spreads about 30% more after the treatment. Secondly, the system is ideal for baking out moisture in the salts we use.
Testimonial from U.S. Naval Research Laboratory in Washington, DC
U.S. Naval Research Lab, Wahington, DC is a proud customer of SAMCO UV-Ozone cleaner, UV-1. This is testimonial from the user.
The SAMCO UV-1 Cleaning system arrived in a very good shape and was well-packaged. It was purchased on recommendation from another group here at NRL that considers its cleaning action essential for silicon wafer bonding. We plan to make the UV-Ozone cleaning part of a standard procedure prior to deposition of self-assembled organic monolayers. The transaction went very smoothly and we would be pleased to work with SAMCO again.