SAMCO is proud to announce our involvement in the 11th Asia-Pacific Conference on Plasma Science and Technology (11th APCPST), to be held at Kyoto University in October 2012. A total of seven research papers by several SAMCO R&D personnel and collaborating researchers will be presented during the conference. Four of these research papers were developed in collaboration with the Tokyo Institute of Technology, Kyushu Institute of Technology, University of Tokushima, Yamaguchi University, and the Dalian University of Technology. The research papers are listed below, in order of presentation.

Every year, SAMCO donates to the Japanese Red Cross as part of our corporate social responsibility (CSR) program. Normally, SAMCO makes this donation at the end of each fiscal year (end of July), but in light of the calamitous East Japan earthquake and tsunami of March 2011, SAMCO provided additional financial aid to the recovery and reconstruction efforts at the end of March 2011. Although more than one year has passed since the disaster, and considering the lack of progress in restoring the afflicted Tohoku region, SAMCO once again offered a donation notably higher than usual. Henceforth, SAMCO pledges to continually support the restoration of the disaster-afflicted Tohoku region.

2012 marks the 25th anniversary of SAMCO’s OPTO Films Research Laboratory, located in the heart of Silicon Valley. Since its founding in 1987, ‘OPTO’ has spearheaded various types of research,and continues to push the R&D frontiers involving diamond, DLC, and other carbon materials. Together with SAMCO’s R&D center in Japan and Cambridge Laboratory in England, OPTO serves as a cornerstone of SAMCO’s global R&D system and contributes to SAMCO’s overall growth.

Transparent Electrode Materials for Simultaneous Amperometric Detection of Exocytosis and Fluorescence Microscopy

Kassandra Kisler¹, Brian N. Kim¹, Xin Liu², Khajak Berberian¹, Qinghua Fang¹, Cherian J. Mathai³, Shubhra Gangopadhyay³, Kevin D. Gillis^2,4, and Manfred Lindau^1
1 School of Applied and Engineering Physics, Cornell University, Ithaca, NY USA
² Dalton Cardiovascular Research Center, University of Missouri, Columbia, MO USA
³ Department of Electrical and Computer Engineering, University of Missouri, Columbia, MO USA
⁴ Departments of Biological Engineering and Medical Pharmacology and Physiology, University of Missouri, Columbia, MO USA
J Biomater Nanobiotechnol. 2012 ; 3(2A): 243–253.

Samco UV-Ozone cleaner at Cornell University was used for photoresist descum in sample preparation.

Our UV-Ozone cleaners are equipped with stage heating and ozone generator, and they enable high-speed photoresist ashing & stripping. The processes can be applied for photoresist decsum application. For more information on our UV-Ozone cleaners, please visit the product page below.
UV-Ozone Cleaners (Table-top & Production Models)

SAMCO has established a new service office in Ho Chi Minh City, Vietnam, to provide technical support and service to our customers in Southeast Asia and India.

Lateral distributed-feedback gratings for single-mode, high-power terahertz quantum-cascade lasers

M. Wienold, A. Tahraoui, L. Schrottke, R. Sharma, X. Lü, K. Biermann, R. Hey, and H. T. Grahn
Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5-7, 10117 Berlin, Germany
Optics Express Vol.20, Issue 10, pp. 11207-11217 (2012)

SAMCO ICP Etching System was used for GaAs/AlGaAs dry etching over SiO₂ mask in fabrication of Terahertz quantum-cascade lasers (THz QCLs).

For our capabilities of GaAs dry etching, please visit the process data page below.
GaAs Dry Etching Process (ICP-RIE)

Mr. Osamu Tsuji, President and CEO of SAMCO Inc., was recently named Conference and Organizing Committee Chairperson of the 11th Asia Pacific Conference on Plasma Science and Technology (APCPST 2012) Conference. 

Professor Hashiguchi at the Research Institute of Electronics Laboratory, Shizuoka University, is a proud customer of SAMCO Deep Reactive Ion Etching (DRIE) System, RIE-800iPB and Reactive Ion Etching (RIE) System, RIE-10NR.
He talked about his research in the field of MEMS (Micro Electro Mechanical System) technology.

Photonic Crystal Point-Shift Nanolasers With and Without Nanoslots—Design, Fabrication, Lasing, and Sensing Characteristics

Shota Kita, Kengo Nozaki, Shoji Hachuda, Hideki Watanabe, Yuji Saito, Shota Otsuka, Takeharu Nakada, Yoshiki Arita, and Toshihiko Baba
Department of Electrical and Computer Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan
IEEE Journal of Selected Topics in Quantum Electronics, (2011) 17, 6

SAMCO ICP Etch System was used for recipe optimization of InP plasma etching. InP etch profile with a high aspect-ratio was successfully fabricated.

For our process capabilities of InP plasma etching, please visit the page below.
InP Dry Etching Process (RIE or ICP-RIE)

Periodic Si nanopillar arrays by anodic aluminum oxide template and catalytic etching for broadband and omnidirectional light harvesting

Hsin-Ping Wang¹, Kun-Tong Tsai^1,2, Kun-Yu Lai¹, Tzu-Chiao Wei¹, Yuh-Lin Wang² and Jr-Hau He^1
1Institute of Photonics and Optoelectronics, & Department of Electrical Engineering, National Taiwan University,
Taipei 10617, Taiwan
²Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei, Taiwan
Optics Express (2012) 20,S1, pp. A94-A103

Samco RIE etcher was used for silicon nanopillar fabrication by silicon plasma etching against anodic aluminum oxide (AAO) mask.

For more information on our silicon plasma etching process capabilities including the Bosch Process etching, please visit the process data pages below.
Silicon Plasma Etching (RIE or ICP Etch)
Silicon Deep Etching Using the Bosch Process

For more detail specs of our RIE etch equipment, please visit the product page below.
RIE Plasma Etcher