Samco Plasma Etching System RIE-10NR updates UIUC Material Research Lab
Samco reveals plans to install plasma etching system RIE-10NR early 2024 as the newest update to the Materials Research Lab (MRL) at the University of Illinois Urbana-Champaign (UIUC).
At the forefront of materials science research, the lab will implement RIE-10NR, a fully automatic reactive ion etching system capable of high-performance processing in a compact space. Known as a staple piece of equipment, the RIE-10NR has more than 30 years of continuous improvement since its initial launch, and 500 systems installed worldwide as of July 2023.
Director of Research Facilities at University of Illinois Urbana-Champaign’s MRL, Dr. Mauro Sardela commented “Samco … [was] very proactive in contacting our lab, visiting us and showcasing their product. [The company was] very flexible in finding the best product to fit our research needs and our current budget.” He also shared the future plans of the lab, stating that “We are hoping to upgrade our RIE capabilities to better support our base of more than 1,000 users. We hope to provide state-of-the-art etching uniformity in our test devices, combined to easy-to-use interface for our various students.” Overall, he wished “[Samco continues] to serve the microelectronics market with state-of-the-art etching and coating tools.”
Tsukasa Kawabe, President and COO of Samco, stated “In the semiconductor manufacturing world, numerous prominent names and corporations exist, but far less willing to work to suit each and every need of a client. Here at Samco, we specialize in making systems like the RIE-10NR, which has an exceptionally small footprint, is cost-effective, boasts exceptional reliability, and benefits from more than three decades of continuous improvements. We are always looking for ways to add value to both the world and for our clients. We are confident MRL at UIUC will be satisfied with the RIE-10NR system.”
About Materials Research Lab at University of Illinois Urbana-Champaign
The Materials Research Lab (MRL) at UIUC is one of the largest shared-instrumentation facilities in the US, promoting interdisciplinary research and education for students, staff, faculty, and researchers with over 200 types of advanced instruments and cutting-edge equipment. The MRL Micro/Nanofabrication Facility is fully a user-supported facility with two class 100 clean rooms totaling 1,900 square feet with instrumentation for micro/nano-fabrication projects including wet and chemical etching, deposition, spin coaters, mask aligners, optical, 3D and electron beam lithography.
About Samco Inc.
Samco Inc. (TSE: 6387) stands for Semiconductor And Materials Company, is a leading manufacturer of processing equipment for the semiconductor and related industries founded by Mr. Osamu Tsuji in Kyoto, Japan in 1979. Over the past forty-five years, more than 4,500 Samco systems have been installed and used in 35 different countries. Its equipment and thin film technology are widely adopted in the fabrication of semiconductor devices, including SiC/GaN power/RF devices, GaAs VCSELs, InP Laser Diodes, MEMS, BAW/SAW Filters TSVs, advanced packaging, and so on.
Learn more at https://www.samcointl.com .
Company Contacts:
TSUCHIHASHI, Atsushi
Public Relations
Phone: 81-75-621-7841
E-mail: tsuchihashi@samco.co.jp
Visit the Samco Booth (#215) at CS MANTECH May 20-23, 2024 in Tucson, Arizona
The CS MANTECH 2024 International Conference on Compound Semiconductor Manufacturing Technology will be located at the JW Marriott Starr Pass Resort in Tucson, Arizona. Monday, May 20th to Thursday, May 23rd, 2024.
Please feel free to visit our booth #215 to know about latest plasma etching, deposition and surface treatment technologies for device fabrication.
Related Topics in: GaN, GaAs, InP, SiC, ultra-wide bandgap semiconductors, Sb compounds, SiGe, and other related materials.
Scientific paper on Si subwavelength grating from Tohoku University, Japan
Micro-fabricated Si subwavelength grating for frequency-domain THz beam steering covering the 0.3–0.5 THz frequency band
Kohei Chiba, Taiyu Okatani, Naoki Inomata, and Yoshiaki Kanamori
Graduate School of Engineering, Department of Robotics, Tohoku University, 6-6-01 Aoba, Aramaki,
Aoba-ku, Sendai, Miyagi, Japan
Opt. Express 31, 27147-27160 (2023)
Samco PECVD system PD-100ST was used for SiO2 film deposition using TEOS.
Scientific paper on polycrystalline Si film from Colorado School of Mines
Pinhole electrical conductivity in polycrystalline Si on locally etched SiNy/SiOx passivating contacts for Si solar cells
C.L. Anderson a b, H.L. Guthrey b, W. Nemeth b, C.-S. Jiang b, M.R. Page b, P. Stradins a b, S. Agarwal a b
a
Department of Chemical and Biological Engineering, Colorado School of Mines, Golden, CO, 80401, USA
b
National Renewable Energy Laboratory, Golden, CO, 80401, USA
Materials Science in Semiconductor Processing, Volume 165, 2023, 107655,
ISSN 1369-8001,
https://doi.org/10.1016/j.mssp.2023.107655.
Boron-doped polycrystalline Si on locally etched silicon nitride/silicon oxide (PLENO) passivating contacts was studied for monocrystalline Si (c-Si) solar cell application. Samco open-load RIE system RIE-10NR was used for silicon etching.
Visit the Samco Booth (#223) at CS MANTECH May 15-18, 2023 in Orlando, Florida
The CS MANTECH 2023 International Conference on Compound Semiconductor Manufacturing Technology will be located at the Hyatt Regency Grand Cypress, next to Disney Springs in Orlando, Florida. Monday, May 15th to Thursday, May 18th, 2023.
Please feel free to visit our booth #223 to know about latest plasma etching, deposition and surface treatment technologies for device fabrication.
Related Topics in: GaN, GaAs, InP, SiC, ultra-wide bandgap semiconductors, Sb compounds, SiGe, and other related materials.
Join us for Photonic Integration Week at Valencia, Spain
Samco will have a booth at 6th Photonic Integration Week conference at at the Universitat Politècnica de València Campus from 20th to 22nd March, 2023.
Please feel free to visit us to know about latest plasma etching, deposition and surface treatment technologies for III-V and silicon photonic device fabrication.
Photonic Integration Week website
Samco Unveils Plasma Enhanced ALD System for SiC and GaN Power Devices
Samco, a leading manufacturer of etching, deposition and surface treatment processing equipment for the semiconductor and related industries and academic facilities, launches the new Plasma Enhanced Atomic Layer Deposition (PEALD) system, “AD-800LP”. The main target of the system is gate oxide film deposition for next-generation power devices of silicon carbide (SiC) and gallium nitride (GaN) materials, which will play important role toward carbon neutral.
The plasma enhanced ALD system “AD-800LP” is a multi-purpose R&D system equipped with a unique ICP plasma source called “Tornado ICP”, in addition to the conventional thermal ALD capability. AD-800LP enables various film deposition such as oxide or nitride films by Tornado ICP, which is Samco’s proprietary plasma technology and is different from remote plasma. Tornado ICP enables stable plasma discharge even in the high-pressure range during ALD deposition.
“We are also considering a cluster ALD system that can connect multiple reaction chambers for production” says Tsukasa Kawabe, President and COO of Samco. “The launch of the AD-800LP will greatly enhance our presence in the world ALD equipment market.” Tsukasa adds.
As a global mid-sized company, Samco has successfully delivered numerous dry etch systems and plasma enhanced CVD systems for the electronic device field, mainly for compound semiconductors such as SiC, GaN, and GaAs, not only in Japan but also in the United States, Europe, Taiwan, Korea, China, Southeast Asia, India, and other countries.
The new Research Center for Nano Thin Films & Materials, which opened in February 2022, conducts research and development of unique thin film deposition, including ALD system. Samco will continue to utilize our “thin-film technology” to develop unique products and expand sales globally.
AD-800LP system photo
About Samco Inc.
Samco Inc. (TSE: 6387) stands for Semiconductor And Materials Company, and is a leading manufacturer of processing equipment for the semiconductor and related industries founded by Mr. Osamu Tsuji in Kyoto, Japan in 1979. Over the past forty-three years, more than 4,300 Samco systems have been installed and used in 35 different countries. Its equipment and thin film technology are widely adopted in the fabrication of semiconductor devices, including BAW filters, SiC power devices, GaN RF devices, GaAs VCSELs, InP lasers, microLEDs, MEMS, TSVs, advanced packaging, and so on. Learn more at https://www.samcointl.com/opto/.
Company Contacts:
TSUCHIHASHI, Atsushi
Public Relations
Phone: 81-75-621-7841
E-mail: tsuchihashi@samco.co.jp
Come Visit Samco Booth 1533 at SEMICON West 2022
Come visit Samco at Semicon West Booth 1533.
We will introduce New plasma etch cluster tools and ALD equipment.
If you are interested in discussion on our process capabilities, please visit our booth.
- SiC MOSFETs
- GaN Power / RF Devices
- GaAs VCSELs
- MicroLEDs
- InP Lasers
- SiC/GaAs Via Hole Etch
- MEMS, TSV
- BAW Filters
- SAW Filters
- Optical Waveguide (LN/LT)
- Quantum Sensors
- SQUIDs
- Failure Analysis
Scientific paper on energy-conversion device from Politecnico di Torino
Textured and Rigid Capillary Materials for Passive Energy-Conversion Devices
Alberghini, M., Morciano, M., Giardino, M., Perrucci, F., Scaltrito, L., Janner, D., Chiavazzo, E., Fasano, M., Asinari, P., Textured and Rigid Capillary Materials for Passive Energy-Conversion Devices. Adv. Mater. Interfaces 2022, 2200057. https://doi.org/10.1002/admi.202200057
Samco RIE system RIE-10NR was used for oxygen plasma treatment for surface functionalization in fabrication of passive energy-conversion devices.
Scientific paper on GaP grating fabrication from University of Ottawa
Scalable Fabrication of Nanogratings on GaP for Efficient Diffraction of Near-Infrared Pulses and Enhanced Terahertz Generation by Optical Rectification
Mohammad Bashirpour1, Wei Cui1, Angela Gamouras1,2 and Jean-Michel Ménard1,2
1 Department of Physics, University of Ottawa, Ottawa, ON K1N 7N9, Canada
2 National Research Council Canada, Ottawa, ON K1A 0R6, Canada
Crystals 2022, 12, 684. https://doi.org/10.3390/cryst12050684
Samco RIE system RIE-10NR was used for SiO2 hardmask patterning using photoresist mask. Then, Samco ICP-RIE system was used for GaP etching using the SiO2 hardmask for wafer-scale fabrication of a surface phase grating with submicron feature sizes.