Scientific Paper on InGaAs MOSFETs Using InGaAs Plasma Etching from MIT
A CMOS-Compatible Fabrication Process for Scaled Self-Aligned InGaAs MOSFETs
Lin, J., D. A. Antoniadis, and J. A. del Alamo
presented at Compound Semiconductor Manufacturing Technology Conference (CS MANTECH), Scottsdale, AZ, May 18-21, 2015, pp. 239-242.
Samco ICP etching system, RIE-200iP was used for optimization of InGaAs/InAlAs/InP dry etching process.