Optimization of graphene dry etching conditions via combined microscopic and spectroscopic analysis

Mariana C. Prado¹, Deep Jariwala², Tobin J. Marks^2,3 and Mark C. Hersam^2,3
1 Departamento de Física, Universidade Federal de Minas Gerais, Av. Antônio Carlos, 6627, 31270-901 Belo Horizonte, Brazil
² Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, USA
³ Department of Chemistry, Northwestern University, Evanston, Illinois 60208, USA
Appl. Phys. Lett. (2013) 102, 193111

Samco RIE System at Northwestern University was used for investigation of reactive ion etching process of graphene.

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