N2-Plasma-Assisted One-Step Alignment and Patterning of Graphene Oxide on a SiO2/Si Substrate Via the Langmuir–Blodgett Technique
Neha Chauhan, Vivekanandan Palaninathan, Sreejith Raveendran, Aby Cheruvathoor Poulose, Yoshikata Nakajima, Takashi Hasumura, Takashi Uchida, Tatsuro Hanajiri, Toru Maekawa and D. Sakthi Kumar
Bio-Nano Electronics Research Centre, Graduate School of Interdisciplinary New Science, Toyo University, Kawagoe, Saitama, Japan
Advanced Materials Interfaces 2015 2 (5)
Samco basic plasma research kit was used for surface modification of SiO2/Si in nitrogen plasma for selective placement and patterning of monolayer Graphene Oxide.