Date : April 10 – 11, 2018
Location : Sheraton Brussels Airport Hotel, Brussels, Belgium

CS International is one of the largest conference on compound semiconductor device and process technologies.
As a process innovator of compound semiconductor materials such as InP, GaAs and GaN,
Samco joins the conference and holds an exhibition booth.

In this year, our target process technologies are
1. InP ridge profile etching for laser diode fabrication
2. GaAs mesa profile etching for VCSEL fabrication
3. GaN etching for laser diode and power device fabrication

We would be happy to discuss more details to solve your process challenges in device fabrication.