Thin crystalline silicon with double-sided nano-hole array fabricated by soft UV-NIL and RIE

Min Wang^1,2, Yulian Zhang¹, Linfeng Lu¹, Dongdong Li¹ and Xufei Zhu^3
1 Shanghai Advanced Research Institute, Chinese Academy of Sciences, 99 Haike Road, Zhangjiang Hi-Tech Park, Pudong, Shanghai 201210, People’s Republic of China
² University of Chinese Academy of Sciences, Beijing 100039, People’s Republic of China
³ School of Chemical Engineering, Nanjing University of Science and Technology, Nanjing 210094, People’s Republic of China
Mater. Res. Express (2017) 4 055005

Crystalline silicon nano-hole array was fabricated using UV nanoimprint (UV-NIL) technology for potential silicon solar cell applications. Samco RIE ether, RIE-10NR was used in device fabrication for photoresist ashing and silicon plasma etching processes. Nano-hole array structures were successfully fabricated.

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