Vacuum Ultraviolet Treatment of Self-Assembled Monolayers: A Tool for Understanding Growth and Tuning Charge Transport in Organic Field-Effect Transistors

Pollawat Prisawong, Peter Zalar, Amir Reuveny, Naoji Matsuhisa, Wonryung Lee, Tomoyuki Yokota, and Takao Someya
Department of Electrical Engineering, University of Tokyo
Adv. Mater. (2016) 28: 2049–2054

Samco plasma cleaner was used for oxygen plasma cleaning during sample preparation.

Constrained spheroids for prolonged hepatocyte culture

Wen Hao Tong^{a, b, c}, Yu Fang^{a, b, c}, Jie Yan^{a, c, g}, Xin Hong^c, Nisha Hari Singh^a,
Shu Rui Wang^d, Bramasta Nugraha^{a, b, e, f}, Lei Xi^{a c}, Eliza Li Shan Fong^c,
Ciprian Iliescu^a, Hanry Yu^{a, b, c, g, h, i},
^a Institute of Biotechnology and Nanotechnology, A*STAR, The Nanos, #04-01, 31 Biopolis Way, Singapore 138669, Singapore
^b NUS Graduate School for Integrative Sciences and Engineering, Centre for Life Sciences (CeLS), #05-01, 28 Medical Drive, Singapore 117456, Singapore
^c Department of Physiology, Yong Loo Lin School of Medicine, MD9-03-03, 2 Medical Drive, Singapore 117597, Singapore
^d Bruker Singapore Pte Ltd., 11 Biopolis Way #10-10, The Helios, Singapore 138667, Singapore
^e ETH Zürich, Department of Biosystem Science and Engineering (D-BSSE), Mattenstrasse 26, CH-4058 Basel, Switzerland
^f Roche Pharmaceutical Research and Early Development, Department of Discovery Technology, Roche Innovation Center Basel, Grenzacherstrasse 124,
CH-4070 Basel, Switzerland
^g Singapore-MIT Alliance for Research and Technology, 1 CREATE Way, #10-01 CREATE Tower, Singapore 138602, Singapore
^h Mechanobiology Institute, National University of Singapore, T-Lab, #05-01, 5A Engineering Drive 1, Singapore 117411, Singapore
ⁱ Department of Biological Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA
Biomaterials (2016) 80 106e120

Samco Basic Plasma Kit was used for surface oxidation of Parylene C membrane in O2 plasma in sample preparation.

Positive onset potential and stability of Cu₂O-based photocathodes in water splitting by atomic layer deposition of a Ga₂O₃ buffer layer

Changli Li^a, Takashi Hisatomi^b, Osamu Watanabe^b, Mamiko Nakabayashi^c, Naoya Shibata^c, Kazunari Domen^b and Jean-Jacques Delaunay^a
Energy Environ. Sci., 2015, 8, 1493

Photoelectrochemical (PEC) water splitting system is a promising application for H₂ production as next-generation clean energy. To achieve stable and efficient water splitting reaction of Cu₂O-based photocathodes, Ga₂O₃ film was introduced as a buffer layer between the Cu₂O layer and the TiO₂ protective layer. Samco Plasma Etching System (RIE etcher) at the University of Tokyo was used for argon plasma treatment of Cu₂O layer to remove the residual contaminants from the annealing and change the hydrophobic surface to a hydrophilic surface.

Samco offers plasma cleaners as well as RIE etchers for plasma surface treatment of various samples. Please visit the product pages below for more details of our plasma cleaners.
General Plasma Cleaners
Remote Plasma Cleaners (Downstream Plasma)

Area-Specific Cell Stimulation via Surface-Mediated Gene Transfer Using Apatite-Based Composite Layers

Yushin Yazaki ^1,2, Ayako Oyane ², Yu Sogo³, Atsuo Ito³, Atsushi Yamazaki¹ and Hideo Tsurushima ^2,4
1 Department of Resources and Environmental Engineering, Waseda University, 3-4-1 Okubo, Shinjuku, Tokyo 169-8555, Japan
² Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology, Central 4, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8562, Japan
³ Health Research Institute, National Institute of Advanced Industrial Science and Technology, Central 6, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8566, Japan
⁴ Department of Neurosurgery, Faculty of Medicine, University of Tsukuba, 1-1-1 Tennoudai, Tsukuba, Ibaraki 305-8575, Japan
Int. J. Mol. Sci. 2015, 16(4), 8294-8309

Samco bench-top RIE etcher was used for plasma treatment of polystyrene substrates before coating with amorphous calcium phosphate (ACP).

Apatite-forming PEEK with TiO2 surface layer coating

Takashi Kizuki, Tomiharu Matsushita and Tadashi Kokubo
Department of Biomedical Sciences, College of Life and Health Sciences, Chubu University, 1200 Matsumoto-cho, Kasugai, Aichi 487-8501, Japan
J Mater Sci: Mater Med (2015) 26:41
DOI 10.1007/s10856-014-5359-1

A method for Polyetheretherketone (PEEK) surface treatment was investigated to achieve better adhesion with TiO₂ film coating for biomedical applications. Oxygen plasma treatment of PEEK using Samco system improved adhesion between the material surface and TiO₂ due to increase of oxygen-containing chemical functional groups on the surface.

For more information on Samco plasma cleaners, please visit the product pages below.
Plasma Cleaners
Remote Plasma Cleaners

Liquid Crystal Foams Generated by Pressure-Driven Microfluidic Devices

Shuojia Shi and Hiroshi Yokoyama
Liquid Crystal Institute, Kent State University, Kent, Ohio 44242, United States
Langmuir, 2015, 31 (15), pp 4429–4434

SAMCO Bench-top Plasma Etching System (RIE etcher) was used for surface activation and bonding of PDMS and glass in microfluidic device fabrication.

For more information on plasma cleaners which are suitable for PDMS plasma treatment to improve surface wettability, please visit the product pages below.
Plasma Cleaners
Remote Plasma Cleaners

N₂-Plasma-Assisted One-Step Alignment and Patterning of Graphene Oxide on a SiO₂/Si Substrate Via the Langmuir–Blodgett Technique

Neha Chauhan, Vivekanandan Palaninathan, Sreejith Raveendran, Aby Cheruvathoor Poulose, Yoshikata Nakajima, Takashi Hasumura, Takashi Uchida, Tatsuro Hanajiri, Toru Maekawa and D. Sakthi Kumar
Bio-Nano Electronics Research Centre, Graduate School of Interdisciplinary New Science, Toyo University, Kawagoe, Saitama, Japan
Advanced Materials Interfaces 2015 2 (5)

Samco basic plasma research kit was used for surface modification of SiO₂/Si in nitrogen plasma for selective placement and patterning of monolayer Graphene Oxide.

The improved piezoelectric properties of ZnO nanorods with oxygen plasma treatment on the single layer graphene coated polymer substrate

Mushtaque Hussain, Mazhar Ali Abbasi, Zafar Hussain Ibupoto, Omer Nur and Magnus Willander
Physical Electronic & Nanotechnology division, Department of Science &Technology, Campus Norrköping, Linköping University, SE-60174 Norrköping, Sweden.
physica status solidi (a) Volume 211, Issue 2, pages 455–459, February 2014

ZnO nanorods were treated with an oxygen plasma using SAMCO Plasma Etching System (RIE etcher) to reduce the defect levels.

Formation of low resistance ohmic contacts in GaN-based high electron mobility transistors with BCl₃ surface plasma treatment

Tatsuya Fujishima¹, Sameer Joglekar¹, Daniel Piedra¹, Hyung-Seok Lee¹, Yuhao Zhang¹, Akira Uedono² and Tomás Palacios^1
1 Microsystems Technology Laboratories, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139-4307, USA
² Division of Applied Physics, Faculty of Pure and Applied Science, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
Appl. Phys. Lett. 103, 083508 (2013)

Surface treatment technique to reduce the resistance and to increase the uniformity of ohmic contacts in AlGaN/GaN high electron mobility transistors was developed using Samco ICP etch system.

For more details of our process solutions for GaN power device fabrication, please visit the page below.
AlGaN/GaN Etch for GaN Power Device Fabrication