Fast patterning and dry-etch of SiNx for high resolution nanoimprint templates

Shu Zhen¹, Wan Jing¹, Lu Bingrui¹, Xie Shenqi¹, Chen Yifang²., Qu Xinping¹ and Liu Ran^1
1 State Key Laboratory of ASIC and System, Department of Microelectronics, Fudan University, Shanghai 200433, China
² Micro and Nanotechnology Centre, Rutherford Appleton Laboratory, Chilton, Didcot, Oxon, OX11 0QX, UK
Journal of Semiconductors (2009) 30, 6

SAMCO Plasma Etching System was used for patterning of SiN_x film (SiN_x plasma etching) with high aspect ratio and vertical sidewalls.

Effect of lattice mismatch on gate lag in high quality InAlN/AlN/GaN HFET structures

J. H. Leach, M. Wu, X. Ni, X. Li, Ü . Ö zgür, and H. Morkoç
Department of Electrical and Computer Engineering, Virginia Commonwealth University, Richmond VA, 23284, USA
Phys. Status Solidi A, 207: 211–216 (2009).

The field effect transistors were fabricated using Ti/Al/Ni/Au Ohmic contacts followed by etched mesa isolation in a Samco ICP Etch System RIE-101iPH using a Cl-based chemistry.

Virginia Commonwealth University is one of Samco customers using our ICP etch system for AlGaN and GaN plasma etching processes in GaN-based power device fabrication.
Virginia Commonwealth University Microelectronics Materials & Device Laboratory website

Northwestern University is a proud customer of SAMCO RIE system, RIE-10NR. The system is used for various types of research including device fabrication.

Inductively coupled plasma etching of III–V antimonides in BCl₃/SiCl₄ etch chemistry

K. Swaminathan⁎, P.E. Janardhanan, O.V. Sulima
Department of Electrical and Computer Engineering, University of Delaware, Newark, Delaware 19716, USA
Thin Solid Films (2008) 516, Issue 23, 1 October 2008, Pages 8712–8716

Inductively coupled plasma etching process of GaSb was investigated using Samco ICP etch system.
Etch rate of 4 μm/min was achieved over photoresist mask.

For more information on our ICP etch systems, please visit the product page below.
ICP Plasma Etcher

Reactive Ion Etching of β-FeSi₂ with Inductively Coupled Plasma

Takayuki Wakayama, Takashi Suemasu, Tomomi Kanazawa and Hiroyuki Akinaga
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
Jpn. J. Appl. Phys. (2006) 45 L569

Samco ICP-RIE etcher was used for plasma etch recipe development of β-FeSi₂ on a silicon substrate using fluorine chemistry.
High etch selectivity of β-FeSi₂ against silicon was investigated.

Please visit our product page for more details of our ICP plasma etch systems.
ICP Plasma Etch Systems for Si, SiO₂, III-V & Metal

Fabrication of GaInAsP/InP photonic crystal lasers by ICP etching and control of resonant mode in point and line composite defects

Kyoji Inoshita and Toshihiko Baba
Department of Electrical & Computer Engineering, Yokohama National University, Japan
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS (2003) 9, NO. 5, SEPTEMBER/OCTOBER

Samco ICP plasma etcher was used for InP plasma etching in GaInAsP/InP photonic crystal laser fabrication.

For more details on our InP plasma etching technologies, please visit the process data page below.
InP Plasma Etching

SAMCO UV-Ozone Cleaners are used for surface cleaning of substrates in device fabrication. This is testimonial from optoelectronics company in Fremont, CA.

The SAMCO UV-1 is a very simple-to-use system and can be effectively integrated into a controlled environment. The system’s internal cavity is leak tight at atmospheric conditions. The system is ideal for accomplishing two goals. First of all, it does an excellent job for treating bond surfaces. Our epoxy spreads about 30% more after the treatment. Secondly, the system is ideal for baking out moisture in the salts we use.

U.S. Naval Research Lab, Wahington, DC is a proud customer of SAMCO UV-Ozone cleaner, UV-1. This is testimonial from the user.

The SAMCO UV-1 Cleaning system arrived in a very good shape and was well-packaged. It was purchased on recommendation from another group here at NRL that considers its cleaning action essential for silicon wafer bonding. We plan to make the UV-Ozone cleaning part of a standard procedure prior to deposition of self-assembled organic monolayers. The transaction went very smoothly and we would be pleased to work with SAMCO again.