An electro-optic polymer-cladded TiO₂ waveguide modulator

Feng Qiu¹ Hiroki Miura², Andrew M. Spring¹, Jianxun Hong¹, Daisuke Maeda³, Masa-aki Ozawa³, Keisuke Odoi³ and Shiyoshi Yokoyama^1,2
1 Institute for Materials Chemistry and Engineering, Kyushu University, 6-1 Kasuga-koen Kasuga-city, Fukuoka 816-8580, Japan
² Department of Molecular and Material Sciences, Kyushu University, 6-1 Kasuga-koen Kasuga-city, Fukuoka 816-8580, Japan
³ Nissan Chemical Industries, Ltd., 2-10-1 Tuboi Nishi, Funabashi, Chiba 274-8507, Japan
Appl. Phys. Lett. (2016) 109, 173301

Waveguide modulator device using organic electro-optic (EO) materials was studied in this research. Samco ICP plasma etcher was used for slot structure formation for TiO₂ plasma etching in fluorine chemistry during device fabrication.

Calculation and fabrication of two-dimensional complete photonic bandgap structures composed of rutile TiO2 single crystals in air/liquid

Sachiko Matsushita¹, Akihiro Matsutani², Yasushi Morii¹, Daito Kobayashi¹, Kunio Nishioka², Dai Shoji², Mina Sato², Tetsu Tatsuma³, Takumi Sannomiya¹, Toshihiro Isobe¹, Akira Nakajima^1
1 Department of Metallurgy & Ceramics Science, Graduate School of Science & Technology, Tokyo Institute of Technology, 2-12-1-S7-8, Ookayama, Meguro-ku, Tokyo, 152-8552, Japan
² Technical Department, Semiconductor and MEMS Processing Center, Tokyo Institute of Technology, 4259-R2-3 Nagatsuta, Midori-ku, Yokohama, 226-8503, Japan
³ Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo, 153-8505, Japan
Journal of Materials Science (2016) Volume 51, Issue 2, pp 1066-1073

Titanium Dioxide (TiO₂) photonic crystal structure was fabricated using Samco Reactive Ion Etch (RIE) system using fluorine chemistry. Two-dimensional photonic band gaps of the TiO₂ structure were theoretically and experimentally studied.

Go to Nakajima & Matushita Lab, Tokyo Institute of Technology

Angled etching of (001) rutile Nb–TiO₂ substrate using SF₆-based capacitively coupled plasma reactive ion etching

Akihiro Matsutani¹, Kunio Nishioka¹, Mina Sato¹, Dai Shoji¹, Daito Kobayashi², Toshihiro Isobe², Akira Nakajima², Tetsu Tatsuma³ and Sachiko Matsushita^2
1 Semiconductor and MEMS Processing Center, Tokyo Institute of Technology, Yokohama 226-8503, Japan
² Department of Metallurgy and Ceramics Science, Tokyo Institute of Technology, Meguro, Tokyo 152-8550, Japan
³ Institute of Industrial Science, The University of Tokyo, Meguro, Tokyo 153-8505, Japan
Jpn. J. Appl. Phys. (2014) 53 06JF02

Rutile Nb–TiO₂ substrates were etched using Samco Reactive Ion Etch (RIE) System. Vertical sidewalls and a smooth surface were successfully achieved.