Category: Sapphire Etch
Scientific Paper on Sapphire Etching from Princeton University Using SAMCO ICP Etch System
Patterning of light-extraction nanostructures on sapphire substrates using nanoimprint and ICP etching with different masking materials
Hao Chen, Qi Zhang and Stephen Y Chou
Nanostructure Laboratory, Department of Electrical Engineering, Princeton University, Princeton, NJ
08544, USA
Nanotechnology (2015) 26 085302 (8pp)
Samco ICP etching system, RIE-200iP was used for recipe optimization of sapphire nanopatterning to improve light extraction of LEDs.
For our process capabilities on Sapphire plasma etching, please visit the process data page below.
Sapphire Dry Etching Process (ICP-RIE)
Scientific Paper on Sapphire Plasma Etching from National Tsing-Hua University, Taiwan
Bulk vertical micromachining of single-crystal sapphire using inductively coupled plasma etching for x-ray resonant cavities
P-C Chen1, P-T Lin1, D G Mikolas1, Y-W Tsai2, Y-L Wang1, C-C Fu1 and S-L Chang2
1 Institute of Nano Engineering and Microsystems, National Tsing-Hua University, No. 101, Kuang-fu Rd, Sec. II, Hsinchu 300, Taiwan
2 Department of Physics, National Tsing-Hua University, No. 101, Kuang-fu Rd, Sec. II, Hsinchu 300, Taiwan
J. Micromech. Microeng. (2015) 25 015016
Samco ICP Etching System was used for the recipe optimization of sapphire plasma etching in x-ray resonant cavity fabrication.
For our process capabilities of sapphire plasma etching, please visit the page below.
Sapphire Dry Etching Process (ICP-RIE)