Optically and electrically excited emissions from organic semiconducting oligomer crystals

Shu Hotta
Faculty of Materials Science and Engineering, Kyoto Institute of Technology, Sakyo-ku, Kyoto, Japan
Polymer International 2016

Samco ICP etch system was used for PDMS mold fabrication to etch away UV-curable photoresist.

Sub-70 nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography

Satoshi Takei and Makoto Hanabata
Toyama Prefectural University, Imizu, Toyama 939-0398, Japan
Appl. Phys. Express (2016) 9 056501

Samco tabletop Reactive Ion Etching (RIE) System was used for evaluation of resist materials on plasma etch selectivity. Resin etching process was performed using fluorine chemistry.

Ambipolar light-emitting organic single-crystal transistors with a grating resonator

Kenichi Maruyama¹, Kosuke Sawabe², Tomo Sakanoue¹, Jinpeng Li¹, Wataru Takahashi¹, Shu Hotta³, Yoshihiro Iwasa⁴ & Taishi Takenobu^1
1Department of Applied Physics, Graduate School of Advanced Science and Engineering, Waseda University, Tokyo 169-8555, Japan.
²Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan.
³Faculty of Materials Science and Engineering Kyoto Institute of Technology, Kyoto 606-8585, Japan.
⁴Quantum-Phase Electronics Center and Department of Applied Physics, The University of Tokyo, Tokyo 113-8656, Japan, RIKEN Center for Emergent Matter Science (CEMS), Wako 351-0198, Japan.
Scientific Reports 5, Article number: 10221 (2015)
doi:10.1038/srep10221

Samco ICP etcher was used for dry etching of UV-curable resist and α,ω-bis(biphenylyl)terthiophene (BP3T) single-crystal in UV-nanoimprint lithography process for electrically driven organic laser fabrication.

High-aspect-ratio nanoimprinted structures for a multi-pole magnetic scale

Zhi-Hao Xu¹, Chien-Li¹, Cheng-Kuo¹, Sheng-Ching³ and Tsung-Shune Chin^2
1 Department of Power Mechanical Engineering, National Tsing Hua University, Hsinchu 30013, TAIWAN
² Department of Materials Science & Engineering, Feng Chia University, Taichung 40724, TAIWAN
³ Department of Mechanical Engineering, National United University, Miaoli 36003, TAIWAN
Microsystem Technologies (2014) 20, 10, pp 1949-1953

SAMCO Plasma Cleaner was used for photoresist stripping/trimming in high-aspect-ratio structure.

For more details of our photoresist stripping & removal process solutions, please visit the page below.
Plasma Ashing & Stripping of Photoresist

Crack-free controlled wrinkling of a bilayer film with a gradient interface

Yan Xuan^a Xu Guo^a Yushuang Cui^a Changsheng Yuan^a Haixiong Ge^a Bo Cui^b and Yanfeng Chen^a
a National Laboratory of Solid State Microstructures, Department of Materials Science and Engineering, College of Engineering and Applied Sciences, Nanjing University, Nanjing, 210093, China
^b Department of Electrical and Computer Engineering, University of Waterloo, 200 University Avenue, West Waterloo, Ontario N2L3G1, Canada
Soft Matter (2012) 8, 9603

SAMCO Plasma Etching System (RIE etcher) was used for plasma etching of silicon-containing resist and PMMA to fabricate wrinkled films.