Sunnyvale, CA – December 2008 — SAMCO, a leading compound semiconductor equipment company has released a new high-volume GaN (Gallium Nitride) ICP etching system model RIE-330iP, for LED manufacturing. A cassette-to-cassette version of this system, model RIE-330iPC, is also available.

Sunnyvale, CA —  SAMCO Inc., a pioneer in plasma etch and PECVD process equipment for over 30 years, recently received an order from the Princeton Institute for the Science and Technology of Materials (PRISM) for its ICP etching and silicon DRIE systems.