SAMCO presented a paper at the AVS 57th International Symposium and Exhibition titled “Hardness and Roughness of SiCN Thin Films Deposited at 500°C by RFPECVD.”
May 4, 2010 – Mr. Osamu Tsuji, CEO of SAMCO, was invited to a seminar hosted by Taiwan Photonics Industry & Technology Development Association in Taipei, Taiwan, where he spoke on the latest technologies and market trends.
SAMCO presented a paper at the 19th International Symposium of Plasma Chemistry in Bochum, Germany, titled “Deposition and Characterization of Silicon Carbon Nitride films prepared by RF-PECVD with Capacitive Coupling.
Professor Ikuo Suemune, Hokkaido University is a proud customer of SAMCO RIE system, ICP etching system and PECVD system.
He talks about his research in nano-photonics and the relationship between the research field and SAMCO’s technologies.
University of Delaware is a proud customer of SAMCO ICP etching systems, RIE-200iP and PECVD System, PD-220N. We received testimonial from Dr. Dennis Prather. He is using the SAMCO systems for his research in nano-photonic devices.