Professor Ikuo Suemune, Hokkaido University is a proud customer of SAMCO RIE system, ICP etching system and PECVD system.
He talks about his research in nano-photonics and the relationship between the research field and SAMCO’s technologies.

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Sunnyvale, CA —  SAMCO Inc., a pioneer in plasma etch and PECVD process equipment for over 30 years, recently received an order from the Princeton Institute for the Science and Technology of Materials (PRISM) for its ICP etching and silicon DRIE systems.

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Reactive Ion Etching of β-FeSi₂ with Inductively Coupled Plasma

Takayuki Wakayama, Takashi Suemasu, Tomomi Kanazawa and Hiroyuki Akinaga
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
Jpn. J. Appl. Phys. (2006) 45 L569

Samco ICP-RIE etcher was used for plasma etch recipe development of β-FeSi₂ on a silicon substrate using fluorine chemistry.
High etch selectivity of β-FeSi₂ against silicon was investigated.

Please visit our product page for more details of our ICP plasma etch systems.
ICP Plasma Etch Systems for Si, SiO₂, III-V & Metal

University of Delaware is a proud customer of SAMCO ICP etching systems, RIE-200iP and PECVD System, PD-220N. We received testimonial from Dr. Dennis Prather. He is using the SAMCO systems for his research in nano-photonic devices.

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Fabrication of GaInAsP/InP photonic crystal lasers by ICP etching and control of resonant mode in point and line composite defects

Kyoji Inoshita and Toshihiko Baba
Department of Electrical & Computer Engineering, Yokohama National University, Japan
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS (2003) 9, NO. 5, SEPTEMBER/OCTOBER

Samco ICP plasma etcher was used for InP plasma etching in GaInAsP/InP photonic crystal laser fabrication.

For more details on our InP plasma etching technologies, please visit the process data page below.
InP Plasma Etching

SAMCO UV-Ozone Cleaners are used for surface cleaning of substrates in device fabrication. This is testimonial from optoelectronics company in Fremont, CA.

The SAMCO UV-1 is a very simple-to-use system and can be effectively integrated into a controlled environment. The system’s internal cavity is leak tight at atmospheric conditions. The system is ideal for accomplishing two goals. First of all, it does an excellent job for treating bond surfaces. Our epoxy spreads about 30% more after the treatment. Secondly, the system is ideal for baking out moisture in the salts we use.

U.S. Naval Research Lab, Wahington, DC is a proud customer of SAMCO UV-Ozone cleaner, UV-1. This is testimonial from the user.

The SAMCO UV-1 Cleaning system arrived in a very good shape and was well-packaged. It was purchased on recommendation from another group here at NRL that considers its cleaning action essential for silicon wafer bonding. We plan to make the UV-Ozone cleaning part of a standard procedure prior to deposition of self-assembled organic monolayers. The transaction went very smoothly and we would be pleased to work with SAMCO again.