Fast patterning and dry-etch of SiNx for high resolution nanoimprint templates

Shu Zhen¹, Wan Jing¹, Lu Bingrui¹, Xie Shenqi¹, Chen Yifang²., Qu Xinping¹ and Liu Ran^1
1 State Key Laboratory of ASIC and System, Department of Microelectronics, Fudan University, Shanghai 200433, China
² Micro and Nanotechnology Centre, Rutherford Appleton Laboratory, Chilton, Didcot, Oxon, OX11 0QX, UK
Journal of Semiconductors (2009) 30, 6

SAMCO Plasma Etching System was used for patterning of SiN_x film (SiN_x plasma etching) with high aspect ratio and vertical sidewalls.

Effect of lattice mismatch on gate lag in high quality InAlN/AlN/GaN HFET structures

J. H. Leach, M. Wu, X. Ni, X. Li, Ü . Ö zgür, and H. Morkoç
Department of Electrical and Computer Engineering, Virginia Commonwealth University, Richmond VA, 23284, USA
Phys. Status Solidi A, 207: 211–216 (2009).

The field effect transistors were fabricated using Ti/Al/Ni/Au Ohmic contacts followed by etched mesa isolation in a Samco ICP Etch System RIE-101iPH using a Cl-based chemistry.

Virginia Commonwealth University is one of Samco customers using our ICP etch system for AlGaN and GaN plasma etching processes in GaN-based power device fabrication.
Virginia Commonwealth University Microelectronics Materials & Device Laboratory website

Until recently, the LED market developed primarily for cellular phones and LCD back lights. Today the market is expanding to LED light bulbs. The LED market is expected to grow when LED bulbs become widely used.

SAMCO’s thin film technology is our core technology, and forms the basis of our CVD, dry etching, and dry cleaning systems for the optoelectronics and electronic component markets. We released MO-CVD system in May 2008. SAMCO’s systems play important roles in the LED manufacturing process. Now, we present our “One-Stop Solution” for the LED manufacturing process.

SAMCO presented a paper at the 19th International Symposium of Plasma Chemistry in Bochum, Germany,  titled “Deposition and Characterization of Silicon Carbon Nitride films prepared by RF-PECVD with Capacitive Coupling.

Northwestern University is a proud customer of SAMCO RIE system, RIE-10NR. The system is used for various types of research including device fabrication.

SAMCO received orders for two cassette-to-cassette ICP etching systems, Model RIE-230iPC from a large LED manufacturing company in Taiwan.

SAMCO installed a PD-220NL system at West Bohemia University in Czech Republic as well as a table-top RIE system in The Netherlands at well-known forensics laboratory.

Samco’s President (Mr. Osamu Tsuji) and the Director of US Operations (Mr. Peter Wood) visited MIT and the Princeton Institute for the Science and Technology of Materials (PRISM) at Princeton University in November 2008 to further strengthen mutual technical collaborations.

Sunnyvale, CA – December 2008 — SAMCO, a leading compound semiconductor equipment company has released a new high-volume GaN (Gallium Nitride) ICP etching system model RIE-330iP, for LED manufacturing. A cassette-to-cassette version of this system, model RIE-330iPC, is also available.

Inductively coupled plasma etching of III–V antimonides in BCl₃/SiCl₄ etch chemistry

K. Swaminathan⁎, P.E. Janardhanan, O.V. Sulima
Department of Electrical and Computer Engineering, University of Delaware, Newark, Delaware 19716, USA
Thin Solid Films (2008) 516, Issue 23, 1 October 2008, Pages 8712–8716

Inductively coupled plasma etching process of GaSb was investigated using Samco ICP etch system.
Etch rate of 4 μm/min was achieved over photoresist mask.

For more information on our ICP etch systems, please visit the product page below.
ICP Plasma Etcher