Smartphones and tablets are now taking the spotlight, together with rise of non-smart mobile phones in many developing countries. In light of this advance, there has been a sudden upsurge in demand for electronic parts such as SAW (Surface Acoustic Wave) filters that are used in mobile phones and tablets.

In March 2011, SAMCO installed three systems at Kyoto University’s Micro/Nano Fabrication Hub.

Chamber conditioning process development for improved inductively coupled plasma reactive ion etching of GaAs/AlGaAs materials

Michael K. Connors, Jason J. Plant, Kevin G. Ray, and George W. Turner
Lincoln Laboratory, Massachusetts Institute of Technology
J. Vac. Sci. Technol. B 31, 021207 (2013)

SAMCO ICP Etching System, RIE-200iP was used for GaAs plasma etching process investigation.

For more details of our GaAs plasma etching capabilities, please visit the page below.
GaAs Dry Etching Process (ICP-RIE)

Monolithic integration of Pb(Zr,Ti)O3 thin film based resonators using a complete dry microfabrication process

Yonggang Jiang¹ , Kensuke Kanda^2,3, Yuki Iga², Takayuki Fujita^2,3, Kohei Higuchi², Kazusuke Maenaka^2,3
1 School of Mechanical Engineering and Automation, Beihang University, Xueyuan Road No. 37, Haidian District, Beijing, 100191, China
² Maenaka Human-Sensing Fusion Project, ERATO, Japan Science and Technology Agency, 2167 Shosha, Himeji, Hyogo, 671-2280, Japan
³ Graduate School of Engineering, University of Hyogo, 2167 Shosha, Himeji, Hyogo, 671-2280, Japan
Microsyst Technol (2013) 19:137–142

SAMCO ICP etch system was used for PZT plasma etching to fabricate thin film MEMS resonators.

On December 20, 2012, SAMCO held its first “Taiwan Thin Film Technology Seminar” at National Chiao Tung University in collaboration with the university’s Department of Photonics.

The seminar, focused on “Next Generation Power Devices (SiC, GaN) and their Processing Technology”, was held in response to strong requests for a SAMCO Thin Film seminar to be held in Taiwan, following successful seminars in China. Importantly the event had an international feel, with professors at the forefront of their fields from Japan, Taiwan, and United Kingdom providing lectures. Due to the swell of interest in wide band-gap semiconductors, more than 150 researchers and technical experts participated in the seminar. The event ended successfully, with an abundant exchange of information between presenters and participants. Following the success of this and other Thin Film Seminars, SAMCO plans to actively pursue seminar opportunities in the future.

On December 1, 2012, SAMCO released its newest plasma etching system – the RIE-600iP. Specifically designed for SiC etching, the RIE-600iP is the latest in a series of plasma etching systems optimized for compound semiconductors. “Next-generation power devices” are expected to contribute to energy conservation and become one of the key technologies in green electronics. SAMCO is confident that the RIE-600iP, and the rise of SiC-based “next-generation power devices”, will contribute to a greener environment.

Crack-free controlled wrinkling of a bilayer film with a gradient interface

Yan Xuan^a Xu Guo^a Yushuang Cui^a Changsheng Yuan^a Haixiong Ge^a Bo Cui^b and Yanfeng Chen^a
a National Laboratory of Solid State Microstructures, Department of Materials Science and Engineering, College of Engineering and Applied Sciences, Nanjing University, Nanjing, 210093, China
^b Department of Electrical and Computer Engineering, University of Waterloo, 200 University Avenue, West Waterloo, Ontario N2L3G1, Canada
Soft Matter (2012) 8, 9603

SAMCO Plasma Etching System (RIE etcher) was used for plasma etching of silicon-containing resist and PMMA to fabricate wrinkled films.

In light of the recent devastation to the United States’ eastern seaboard caused by Hurricane Sandy, we at SAMCO would like to convey our sympathy to those affected by this storm. With over 25 years of presence in the United States, SAMCO has presented a donation to the American Red Cross, to support the recovery and restoration efforts in the affected areas. We express our condolences to all of the individuals and families who were affected by Hurricane Sandy, as well as our best wishes for a smooth recovery.

High-Q AlN photonic crystal nanobeam cavities fabricated by layer transfer

S. Sergent¹, M. Arita¹, S. Kako¹, K. Tanabe¹, S. Iwamoto^1,2 and Y. Arakawa^1,2
1 Institute for Nano Quantum Information Electronics, The University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan
² Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan
Appl. Phys. Lett. 101, 101106 (2012)

AlN nanopattern was fabricated by AlN plasma etching using Samco ICP etch system to improve the quality factor of nanobeam cavities.

For more information on our ICP etching sytems, please visit the product page below.
Samco ICP Plasma Etcher

SAMCO is proud to announce a great milestone – the sale of our 3000th system! As pioneers in thin film technology, SAMCO has provided highly reliable plasma etching, CVD, and surface treatment systems over the past 30 years. On September 30, 2012, our 3000th system (specifically, a plasma etching system) was delivered to the Japan Electronic Materials Corporation. In celebration of this milestone Mr. Osamu Tsuji, SAMCO President and CEO, paid a special visit to the Japan Electronic Materials Corporation’s headquarters in Amagasaki (Hyogo Prefecture) and presented a memento to its chairman, Mr. Hideo Sakane. SAMCO’s memento (a digital clock) was received with great appreciation.