SAMCO MEMS Workshop “MEMS and Nano Processes”

Day : February 2nd, 2016
Venue : Lecture Hall, VMCC, IIT Bombay (VICTOR MENEZES CONVENTION CENTRE) in India

This workshop aims at providing a broad overview on MEMS & NEMS devices research based on plasma processing technologies.
This 1st workshop in India will be organized by SAMCO to celebrate the inauguration of the MEMS/NEMS prototype facility center in IIT Bombay.

Sweden-based SiC CVD developer and manufacturer Epiluvac AB has entered into a collaboration with SAMCO, a semiconductor process equipment developer and manufacturer based in Japan, in which Epiluvac will introduce new clients to SAMCO in Sweden, Norway, Finland and Denmark.

Enhancement of microfluidic particle separation using cross-flow filters with hydrodynamic focusing

Yun-Yen Chiu, Chen-Kang Huang, and Yen-Wen Lu
Department of Bio-Industrial Mechatronics Engineering, National Taiwan University, Taipei 10617, Taiwan, Republic of China
Biomicrofluidics (2016) 10, 011906

Samco silicon DRIE system at National Taiwan University was used for microchannel fabrication with crossflow filtration mechanism.

For more details of our deep silicon etching capabilities, please visit the process data pages below.
Deep Silicon Trench/Via Hole Etching using Bosch Process
Si DRIE (Deep Reactive Ion Etching) for MEMS and TSV

Constrained spheroids for prolonged hepatocyte culture

Wen Hao Tong^{a, b, c}, Yu Fang^{a, b, c}, Jie Yan^{a, c, g}, Xin Hong^c, Nisha Hari Singh^a,
Shu Rui Wang^d, Bramasta Nugraha^{a, b, e, f}, Lei Xi^{a c}, Eliza Li Shan Fong^c,
Ciprian Iliescu^a, Hanry Yu^{a, b, c, g, h, i},
^a Institute of Biotechnology and Nanotechnology, A*STAR, The Nanos, #04-01, 31 Biopolis Way, Singapore 138669, Singapore
^b NUS Graduate School for Integrative Sciences and Engineering, Centre for Life Sciences (CeLS), #05-01, 28 Medical Drive, Singapore 117456, Singapore
^c Department of Physiology, Yong Loo Lin School of Medicine, MD9-03-03, 2 Medical Drive, Singapore 117597, Singapore
^d Bruker Singapore Pte Ltd., 11 Biopolis Way #10-10, The Helios, Singapore 138667, Singapore
^e ETH Zürich, Department of Biosystem Science and Engineering (D-BSSE), Mattenstrasse 26, CH-4058 Basel, Switzerland
^f Roche Pharmaceutical Research and Early Development, Department of Discovery Technology, Roche Innovation Center Basel, Grenzacherstrasse 124,
CH-4070 Basel, Switzerland
^g Singapore-MIT Alliance for Research and Technology, 1 CREATE Way, #10-01 CREATE Tower, Singapore 138602, Singapore
^h Mechanobiology Institute, National University of Singapore, T-Lab, #05-01, 5A Engineering Drive 1, Singapore 117411, Singapore
ⁱ Department of Biological Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA
Biomaterials (2016) 80 106e120

Samco Basic Plasma Kit was used for surface oxidation of Parylene C membrane in O2 plasma in sample preparation.

Photonic nanojet induced modes generated by a chain of dielectric microdisks

Cheng-Yang Liu, Chun-Ci Li
Department of Mechanical and Electro-Mechanical Engineering, Tamkang University, New Taipei City, Taiwan
Optik – International Journal for Light and Electron Optics (2016) 127, 1, pp 267–27

Samco Reactive Ion Etching (RIE) system was used for dielectric layer etching to fabricate a microdisc device.

Creation of atomically flat Si{111}7 × 7 side-surfaces on a three-dimensionally-architected Si(110) substrate

Azusa N. Hattori^a, Ken Hattori^b, Shohei Takemoto^b, Hiroshi Daimon^b and Hidekazu Tanaka^a
a Nanoscience and Nanotechnology Center, The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihoga-oka, Ibaraki, Osaka 567-0047, Japan
^b Graduate School of Materials Science, Nara Institute of Science and Technology, Takayama 8916-5, Ikoma, Nara 630-0192, Japan
Surface Science (2016) 644, 86–90

Samco silicon DRIE System was used for deep silicon etching to fabricate three-dimensional (3D) nanostructures.

For more details of our deep silicon etching capabilities, please visit the process data pages below.
Deep Silicon Trench/Via Hole Etching using Bosch Process
Si DRIE (Deep Reactive Ion Etching) for MEMS and TSV

Electrostatically assisted fabrication of silver–dielectric core/shell nanoparticles thin film capacitor with uniform metal nanoparticle distribution and controlled spacing

Xue Li^{a, b}, Olivia Niitsoo^a and Alexander Couzis^a
a Department of Chemical Engineering, The City College of New York, NY 10031, United States
^b Department of Chemical and Biomolecular Engineering, Lehigh University, Bethelehem, PA 18015, United States
Journal of Colloid and Interface Science (2016) 465, 333–341

Samco UV-Ozone cleaner at the City College of New York was used for UV-Ozone surface cleaning of ITO substrates before nanoparticle deposition.

Coherent diffraction imaging of non-isolated object with apodized illumination

Krishna P. Khakurel^1,2, Takashi Kimura^1,2,3, Yasumasa Joti⁴, Satoshi Matsuyama^3,4, Kazuto Yamauchi^3,4 and Yoshinori Nishino^1,2,3
1Research Institute for Electronic Science, Hokkaido University, Kita 21, Nishi 10, Kita-ku, Sapporo, Hokkaido, 001-0021, Japan
²Graduate School of Information Science, Hokkaido University, Kita 21, Nishi 10, Kita-ku, Sapporo, Hokkaido, 001-0021, Japan
³Japan Science and Technology Agency, CREST, 4-1-8 Honcho, Kawaguchi, Saitama 332-0012, Japan
⁴Japan Synchrotron Radiation Research Institute/SPring-8, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198, Japan
⁵Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1, Yamadaoka, Suita, Osaka 565-0871, Japan
Optics Express (2015) 23, 22, pp. 28182-28190

SAMCO RIE plasma etcher at Hokkaido University was used for fabrication of coherent diffraction imaging samples.

Direct-liquid-evaporation chemical vapor deposition of smooth, highly conformal cobalt and cobalt nitride thin films

Jing Yang^a, Kecheng Li^a, Jun Feng^b and Roy G. Gordon^a,b
a School of Engineering, Applied Sciences, Harvard University, Cambridge, MA 02138, USA
^b Department of Chemistry and Chemical Biology, Harvard University, Cambridge, MA 02138, USA

SAMCO UV-Ozone cleaner at Harvard University was used to remove organic contaminants from samples.

SAMCO has developed and launched a new Atomic Layer Deposition (ALD) system focusing on gate oxide formation of Silicon Carbide (SiC) and Gallium Nitride (GaN) power devices, which are key for energy-saving devices or “green electronics”.