Dielectric Coating Thermal Stabilization During GaAs-Based Laser Fabrication for Improved Device Yield

MICHAEL K. CONNORS^1,3, JAMAL E. MILLSAPP² and GEORGE W. TURNER^1
1 Lincoln Laboratory, Massachusetts Institute of Technology, 244 Wood Street, Lexington, MA 02
420, USA.
² Toho Technology Inc., Chicago, IL 60625, USA.
Journal of Electronic Materials (2016) pp 1-7

A 300-nm thick SiO₂ film was deposited using Samco Cathode PECVD system, PD-200STP to insulate the exposed ridge sidewalls.

For more details on Samco’s low-temperature PECVD technologies and process capabilities, please visit our featured process solution page below.
Low-temperature PECVD for SiO₂ & SiN_x Deposition

Improving the Brightness and Reliability of InGaN/GaN Near Ultraviolet Light Emitting Diodes by Controlling the Morphology of the GaN Buffer Layer

S. C. Tsai, H. C. Fang, C. H. Lu and Y. L. Lai
National Cheng Kung University, Tainan, Taiwan
Journal of Display Technology (2016) (Volume:PP , Issue: 99 )

Samco ICP etch system at National Cheng Kung University was used for InGaN/GaN dry etching in UV LED fabrication.
For our process capabilities of GaN dry etching, please visit the process data page below.
GaN Dry Etching Process (RIE or ICP-RIE)

Controlled superficial assembly of DNA–amorphous calcium phosphate nanocomposite spheres for surface-mediated gene delivery

Ayako Oyanea^a, Hiroko Araki^a, Maki Nakamura^a, Yoshiki Shimizu^a, Quazi T.H. Shubhra^a, Atsuo Ito^b, Hideo Tsurushima^{a, c}

^a Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
^b Health Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Central 6, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8566, Japan
^c Department of Neurosurgery, Faculty of Medicine, University of Tsukuba, 1-1-1 Tennoudai, Tsukuba, Ibaraki 305-8575, Japan

SAMCO table-top RIE systsm was used for surface modification of polystyrene substrates in an oxygen plasma.

Plasmonic arrays of titanium nitride nanoparticles fabricated from epitaxial thin films

Shunsuke Murai, Koji Fujita, Yohei Daido, Ryuichiro Yasuhara, Ryosuke Kamakura, and Katsuhisa Tanaka
Shunsuke Murai^1,2 Koji Fujita^1,3> Yohei Daido¹ Ryuichiro Yasuhara¹ Ryosuke Kamakura¹ and Katsuhisa Tanaka^1
1 Department of Material Chemistry, Graduate School of Engineering, Kyoto University, Katsura, Nishikyo-ku, Kyoto 615-8510, Japan.
Optics Express Vol. 24, Issue 2, pp. 1143-1153 (2016) •doi: 10.1364/OE.24.001143

Titanium Nitiride (TiN) nanoparticle arrays were fabricated using nanoimprint technologies.
For nanoimprint mold fabrication, Samco deep silicon etching system at Kyoto University was used for nanostructure fabrication on silicon molds. After transferring of the silicon mold pattern to photoresist on TiN substrate, Samco ICP etching system at Kyoto University was used for TiN dry etching over photoresist to fabricate TiN nanoparticle arrays.

300-nm Imperceptible, Ultraflexible, and Biocompatible e-Skin Fit with Tactile Sensors and Organic Transistors

Robert A. Nawrocki¹, Naoji Matsuhisa^1,2, Tomoyuki Yokota¹ and Takao Someya^1
1 Department of Electrical Engineering and Information Systems, School of Engineering, The University of Tokyo, Bunkyo-ku, Tokyo, Japan
² Advanced Leading Graduate Course for Photon Science, Bunkyo-ku, Tokyo, Japan
Advanced Electronic Materials (2016)

Samco open-load RIE etcher was used for contact hole formation of encapsulation layers.

ITO-Based MEMS Sensor Electrode for Dynamic Cow-Rumen pH Sensing

Lan Zhang¹, Jian Lu¹, Hirofumi Nogami^{1, 2}, Hironao Okada², Toshihiro Itoh^{1, 3}

¹ Research Center for Ubiquitous MEMS and Micro Engineering (UMEMSME), National Institute of Advanced Industrial Science and Technology (AIST)
² Department of Mechanical Engineering, Kyushu University
³ Department of Human and Engineered Environmental Studies, the University of Tokyo
IEEJ Transactions on Sensors and Micromachines (2016) 136, No. 11 P 482-487
A PH sensor was fabricated combining a metal-oxide-semiconductor field-effect transistor (MOSFET) with a separate sensing electrode made of indium tin oxide (ITO) film. Samco RIE etch system was used for plasma etching of an amorphous fluoropolymer CYTOP fluoropolymer film in device fabrication.

Novel Nano-Device to Measure Voltage-Driven Membrane Transporter Activity

Rikiya Watanabe, Naoki Soga, and Hiroyuki Noji
Dept. of Appl. Chem., Univ. of Tokyo, Tokyo, Japan
IEEE TRANSACTIONS ON NANOTECHNOLOGY (2016) 15, NO. 1

SAMCO open-load Reactive Ion Etching Tool was used for patterning of carbon-fluorine hydrophobic polymer (CYTOP) by dry etching of the layer against photoresist.

Microfluidic chips for forward blood typing performed with a multichannel waveguide-mode sensor

Hiroki Ashiba^a, Makoto Fujimaki^a, Koichi Awazuv, Torahiko Tanaka^b and Makoto Makishima^b
a Electronics and Photonic Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
^b Division of Biochemistry, Department of Biomedical Sciences, Nihon University School of Medicine, 30-1 Oyaguchi-kamicho, Itabashi, Tokyo 173-8610, Japan
Sensing and Bio-Sensing Research 2016 Volume 7, March 2016, Pages 121-126

Samco ICP etcher was used to fabricate a mold template of microfluidic chips by silicon plasma etching.

For our process capabilities of silicon plasma etching, please visit the process data page below.
Si Dry Etching Process (RIE, ICP-RIE or XeF₂ Etch)

SAMCO held its first thin film technology workshop in India at the Indian Institute of Technology Bombay on February 2nd. The event, entitled “MEMS and Nano Processes”, was a collaboration with Professor V. Ramgopal Rao of IIT Bombay’s Electrical Engineering Department.

“With a growing economy that is expected to accelerate in the future, India continues to set an example for emerging markets around the world through its innovative research and development activities,” said Osamu Tsuji, SAMCO’s President, Chairman and CEO, during his opening remarks at the workshop.

Vacuum Ultraviolet Treatment of Self-Assembled Monolayers: A Tool for Understanding Growth and Tuning Charge Transport in Organic Field-Effect Transistors

Pollawat Prisawong, Peter Zalar, Amir Reuveny, Naoji Matsuhisa, Wonryung Lee, Tomoyuki Yokota, and Takao Someya
Department of Electrical Engineering, University of Tokyo
Adv. Mater. (2016) 28: 2049–2054

Samco plasma cleaner was used for oxygen plasma cleaning during sample preparation.