Scientific Paper on AlN Nanocavity Fabrication Using AlN Plasma Etching from the University of Tokyo

High-Q AlN photonic crystal nanobeam cavities fabricated by layer transfer

S. Sergent¹, M. Arita¹, S. Kako¹, K. Tanabe¹, S. Iwamoto^1,2 and Y. Arakawa^1,2
1 Institute for Nano Quantum Information Electronics, The University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan
² Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan
Appl. Phys. Lett. 101, 101106 (2012)

AlN nanopattern was fabricated by AlN plasma etching using Samco ICP etch system to improve the quality factor of nanobeam cavities.

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Samco ICP Plasma Etcher